新加坡两位画家张得顺（81岁）和林福安（77岁），为荣誉国务资政吴作栋创建的新传媒协立慈善基金（Mediacorp Enable Fund）举办“当代艺术展”，作品售出一半所得捐赠该基金。画家们想通过绘画回馈社会，尤其是弱势群体需要社会的关怀。基金由新加坡协助残障者自立局（SG Enable）管理，旨在创建对残障人士友好包容的社会。

张得顺毕业于中正中学、南洋美专，是新加坡艺术协会会员。他将水墨与重彩融于画中，题材包括花鸟、山水、建筑，三度获得林子平艺术比赛金奖，2019年办首次书画个展“润泽”。

画家林福安（又名HALim哈林）受父亲、水彩画家林清河的影响，上过南洋美专基础课程。他通过油彩和水混合的颜色，加入其他废弃品，随机混合成，创造出不同的肌理效果。他自2009年起，在新加坡、中国、菲律宾办过个展。

展览即日起至10月16日，星期三至日上午11时至晚上7时（星期一、二休息），在Pico Creative Centre（20 Kallang Ave #02-02 S339411， 乘搭Lobby B电梯）举行，入场免费。

Mr. Teo Teck Soon (81) and Mr. Lim Fook Ann (77), two renowned Singaporean painters, are holding a joint contemporary art exhibition to support the Mediacorp Enable Fund, a charity founded by Emeritus Senior Minister Goh Chok Tong. Half of the proceeds from the sale of their artworks will be donated to the fund. Through their art, the painters aim to give back to society, particularly to vulnerable groups in need of community support.

Managed by SG Enable, the fund strives to create an inclusive society that is friendly towards people with disabilities.

Mr. Teo Teck Soon, a graduate of Chung Cheng High School and the Nanyang Academy of Fine Arts, is a member of the Singapore Art Society. His works, which often blend ink and heavy colors, depict a range of subjects including flowers,birds, landscapes, and architecture. He has won the Lim Tze Peng Art Competition three times and held his first solo exhibition, "润泽" (润泽, meaning 'moistening' or 'nourishing'), in 2019.

Mr. Lim Fook Ann, also known as HALim, was influenced by his father, watercolor painter Lim Cheng Hoe. He attended the foundational courses at the Nanyang Academy of Fine Arts. Mr. Lim Fook Ann creates unique textures by mixing oil paints,water, and other discarded materials. Since 2009, he has held solo exhibitions in Singapore, China, and the Philippines.

The exhibition will be held from today until October 16th, Wednesdays to Sundays, from 11 AM to 7 PM (closed on Mondays and Tuesdays).

Venue: Pico Creative Centre, 20 Kallang Avenue #02-02 S339411. Please take the Lobby B elevator.

Admission: Free